Aligned Sub-10-nm Block Copolymer Patterns Templated by Post Arrays
نویسندگان
چکیده
منابع مشابه
Aligned sub-10-nm block copolymer patterns templated by post arrays.
Self-assembly of block copolymer films can generate useful periodic nanopatterns, but the self-assembly needs to be templated to impose long-range order and to control pattern registration with other substrate features. We demonstrate here the fabrication of aligned sub-10-nm line width patterns with a controlled orientation by using lithographically formed post arrays as templates for a 16 kg/...
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ژورنال
عنوان ژورنال: ACS Nano
سال: 2012
ISSN: 1936-0851,1936-086X
DOI: 10.1021/nn203767s